Custom Metal Sputtering Cathode Target Featuring Superior Conductivity and Uniform Thickness for Industrial Coating Processes

Product Description:

The Metal Sputtering Target is a critical component widely used in the field of thin film deposition technologies, particularly in Physical Vapor Deposition (PVD) processes. As a high-quality Metal Sputtering Cathode Target, it is designed to deliver exceptional performance and reliability in various industrial and research applications. This product serves as the source material that is atomized and deposited onto substrates to create uniform, high-purity metallic coatings, making it indispensable in semiconductor manufacturing, optical coatings, decorative finishes, and advanced electronics.

Manufactured from premium-grade metals, the Metal Sputtering Target ensures superior purity and structural integrity, which are essential for achieving consistent sputtering rates and optimal film quality. The target is engineered to withstand the rigorous conditions of sputtering chambers, including high vacuum environments, intense plasma bombardment, and elevated temperatures. These properties make it an ideal choice for Physical Vapor Deposition Target applications where durability and precision are paramount.

One of the standout features of this Metal Sputtering Cathode Target is its versatility. It is compatible with various sputtering techniques such as DC, RF, and magnetron sputtering, allowing it to be used with a broad range of equipment and processes. This flexibility enables manufacturers and researchers to tailor their coating processes to specific materials and thickness requirements, ultimately enhancing the performance of the final product. Whether the application demands thin conductive layers for microelectronics or robust protective coatings for industrial components, this sputtering target delivers consistent and high-quality results.

The Metal Coating Sputtering Target is also distinguished by its precise dimensional tolerances and surface finish. Meticulous machining and polishing processes are employed to ensure flatness and uniformity, which are critical for stable plasma generation and uniform erosion during sputtering. This attention to detail minimizes defects in the deposited films and extends the target’s service life, reducing downtime and operational costs for users. Additionally, the target’s design can be customized to meet specific size and shape requirements, accommodating unique sputtering systems and maximizing material utilization.

In terms of material options, the Metal Sputtering Target is available in a wide variety of metals including aluminum, copper, titanium, nickel, tungsten, and precious metals such as gold and platinum. Each metal choice offers distinct physical and chemical properties that cater to different application needs. For example, aluminum targets are favored for their excellent conductivity and reflectivity, while titanium targets provide superior corrosion resistance and strength. This range of materials ensures that users can select the ideal target to optimize their coating process and product performance.

Furthermore, the manufacturing process of the Metal Sputtering Cathode Target incorporates advanced metallurgical techniques such as vacuum melting, hot forging, and hot rolling, which enhance the target’s homogeneity and minimize impurities. These processes contribute to improved sputtering efficiency and film adhesion, which are critical for high-performance coatings. Quality control measures, including chemical analysis and non-destructive testing, are rigorously applied to guarantee that each target meets stringent industry standards.

Overall, the Metal Sputtering Target is a vital component for achieving superior coating results in Physical Vapor Deposition processes. Its high purity, excellent mechanical properties, and compatibility with diverse sputtering methods make it an indispensable tool for producing reliable and high-quality thin films. Whether utilized as a Metal Sputtering Cathode Target in semiconductor fabrication or as a Metal Coating Sputtering Target in decorative and protective coatings, this product consistently delivers excellent performance, durability, and value.

Choosing the right Metal Sputtering Target can significantly impact the efficiency and quality of the sputtering process. By investing in this top-tier product, users benefit from enhanced film uniformity, reduced contamination, and extended target lifespan. This ultimately leads to improved production yields, lower maintenance costs, and superior end-use product characteristics. For industries that demand precision and excellence in thin film coatings, the Metal Sputtering Target stands out as a reliable and high-performance solution.

Features:

• High Purity Metal Target ensuring superior coating quality
• Designed as a Metallic Sputtering Source Target for efficient material deposition
• Excellent uniformity and density for consistent sputtering performance
• Compatible with various sputtering systems and applications
• Durable and reliable Metallic Sputtering Source Target for long service life
• Available in multiple metal compositions to suit diverse industrial needs
• Precision manufactured to meet strict industry standards

Technical Parameters:

Applications:

The Changsheng Metal Sputtering Target, available in models ASTM F67, ASTM F136, and ASTM B381, is a high-quality product designed for various advanced industrial applications. As a High Purity Metal Target, it plays a critical role in thin film deposition processes, ensuring superior coating performance and consistency. Manufactured in China under strict ISO 9001:2015 certification standards, this product guarantees reliability and excellence for professional use.

One of the primary application occasions for the Changsheng Metal Sputtering Target is in the semiconductor and electronics industries. Here, the Industrial Metal Sputtering Target is essential for fabricating microelectronic devices, integrated circuits, and thin film transistors. Its high purity ensures minimal contamination, resulting in high-performance electronic components with enhanced durability and efficiency. This makes it ideal for use in cleanroom environments where precision and quality are paramount.

In addition to electronics, this Thin Film Deposition Target is extensively used in the production of optical coatings. These coatings are applied on lenses, mirrors, and other optical components to improve light transmission, reflection, and durability. The Changsheng sputtering targets provide consistent elemental composition, which is crucial for achieving uniform thin films with excellent adhesion and optical properties.

The Changsheng Metal Sputtering Target is also widely utilized in the automotive and aerospace sectors for depositing protective and decorative coatings on various metal parts. The industrial-grade targets help enhance corrosion resistance, wear resistance, and aesthetic appeal, thereby extending the lifespan of critical components under harsh operating conditions. With a supply ability of 10,000 pcs per month and a minimum order quantity of 200 pcs, the product supports large-scale manufacturing demands efficiently.

Businesses benefit from flexible payment terms including L/C, T/T, Western Union, MoneyGram, and PayPal, making procurement smooth and convenient. Each order is carefully packaged in wooden cases or cartons, with packaging options customizable according to customer requirements. The typical delivery time ranges from 15 to 20 working days, ensuring timely supply for ongoing production schedules.

Priced competitively at USD 24 per piece, the Changsheng Metal Sputtering Target offers excellent value without compromising on quality. Its combination of high purity, industrial applicability, and adherence to international quality standards makes it an indispensable material for organizations involved in thin film deposition and advanced coating technologies worldwide.

Support and Services:

Our Metal Sputtering Targets are designed to deliver exceptional performance and reliability in thin film deposition processes. For technical support, we provide comprehensive assistance including material selection guidance, custom target fabrication, and troubleshooting advice to optimize your sputtering applications.

We offer expert consultation to help you choose the right target composition and size according to your specific requirements. Our team can also assist with target installation procedures and maintenance tips to ensure maximum lifespan and consistent film quality.

In addition to standard products, we provide custom services such as alloy targets, composite targets, and targets with special backing plates or bonding materials. Our quality control processes guarantee that each target meets stringent purity and dimensional specifications.

For any technical inquiries or service requests related to our Metal Sputtering Targets, our support team is committed to delivering timely and effective solutions to enhance your manufacturing process and product yield.

Packing and Shipping:

Product Packaging and Shipping

Our metal sputtering targets are carefully packaged to ensure safe delivery and maintain product integrity. Each target is securely wrapped in protective materials to prevent surface damage and contamination during transit.

The targets are then placed in sturdy, custom-designed boxes with adequate cushioning to absorb shocks and vibrations. For added protection, desiccants and anti-static bags are used to preserve the target's quality and prevent oxidation.

We offer various shipping options to meet your delivery requirements, including standard, expedited, and freight services. All shipments are tracked and insured for your peace of mind.

Upon receiving your order, please inspect the packaging and product immediately. If any damage is observed, contact our customer service team promptly for assistance.

FAQ:

Q1: What brand and model numbers are available for the Metal Sputtering Target?

A1: The Metal Sputtering Target is offered under the Changsheng brand and is available in model numbers ASTM F67, ASTM F136, and ASTM B381.

Q2: What certifications does the Metal Sputtering Target have?

A2: The product is certified with ISO 9001:2015, ensuring quality management standards are met.

Q3: What is the minimum order quantity and price per piece?

A3: The minimum order quantity is 200 pieces, and the price is USD 24 per piece.

Q4: What payment methods are accepted for purchasing the Metal Sputtering Target?

A4: We accept payment via L/C, T/T, Western Union, MoneyGram, and PayPal for your convenience.

Q5: What is the typical delivery time and packaging for the Metal Sputtering Target?

A5: The delivery time is usually 15 to 20 working days. Packaging is done in wooden cases or cartons and can be customized according to customer requirements.